
软件开发商 Siemens EDA(前身为 Mentor Graphics)推出了 Calibre 2021.1。该设计解决方案提供了一个完整的 IC 验证和 DFM 优化平台,可加快从创建到制造的设计,满足所有签核要求。
Siemens EDA(前身为 Mentor Graphics)是 IC 设计、验证和制造领域的领导者。我们的工具使客户能够设计推动全球数字化、高速有线和 5G 通信、云计算、自动驾驶和人工智能更智能的一切的创新 IC。
由于 Calibre nmPlatform 的卓越性能、准确性和可靠性,Calibre Design Solutions 是 IC 验证的行业领导者。与代工厂、IC 设计公司和行业标准组织的紧密合作确保 Calibre 工具不断提供满足或超过最先进要求的创新功能,并提供真正的竞争价值。
Calibre 是设计组织和代工厂广泛使用的最受欢迎的工具之一。Calibre 具有不同的模块,可在流片后执行各种功能。流片后工作流程的挑战是保持对高晶圆良率的严格控制,这将导致掩模时间和操作成本的减少。虽然来自模块的一些工作负载(例如预 OPC 阶段的分散条和偏差)是内存密集型的,但 PM、OPC 和 MDP 生成的工作负载是延迟密集型的。它们依靠存储、网络和计算基础设施的性能来支持和补充 Calibre 的速度和质量。
Calibre 是片上硅 (SoC) 制造过程中最常用的工具之一。该工艺处理从 Calma 图形数据系统 (GDSII) 到掩模流程的工作流程的不同部分,提供高晶圆良率并降低运营成本。芯片设计公司提供的输入文件包括采用 GDSII 或开放艺术品系统交换标准 (OASIS) 格式的 SoCs 的物理细节。虽然 Calibreas 应用程序越来越优化以减少屏蔽时间,但底层存储基础架构在周转时间 (TAT) 方面也发挥着重要作用。基础架构由网络文件共享存储、网络层和计算场组成。
Calibre2021是Mentor Graphics公司专注为深亚微米工艺技术中复杂芯片设计的物理验证挑战而研发的业界第一个最高性能的环境和技术。它基于先进的层次化算法和技术,能够快速、准确、完善的对混合电路进行物理验证及寄生提取。目前,它已经被全球主流的foundry采用,并成为其内部的物理验证标准。在国内Calibre也已经被众多设计公司采用为深亚微米集成电路的物理验证工具。Calibre主要包含有以下几个模块,市面上主流版图编辑器与Calibre工具接口的Calibre interactive;版图验证工具Calibre nmDRC,Calibre LVS;层次化的验证模块nmDRC-H和LVS-H;具有图像侦错环境的Calibre RVE;大型GDSII版图数据快速读取模块Calibre DESIGNrev及混合级电路寄生提取工具Calibre xRC和xL。Calibre既可作为一个单点工具来使用,也可以集成在目前主流的版图工具中。Calibre物理验证平台涵盖了Signoff级验证的gds到mask的所有验证步骤,包括DRC,LVS,PEX,DFM以及可靠性验证,3D验证所有方面。
The software developer Siemens EDA (formerly Mentor Graphics) has unveiled Calibre 2021.1. This Design Solutions delivers a complete IC verification and DFM optimization platform that speeds designs from creation to manufacturing, addressing all sign-off requirements.
Siemens EDA (formerly Mentor Graphics) is a leader in IC design, verification, and manufacturing. Our tools enable customers to design the innovative ICs that are driving digitalization worldwide, proliferating high-speed wired and 5G communications, cloud computing, autonomous driving, and AI-smarter everything.
Calibre Design Solutions is the industry leader for IC verification, due to the exceptional performance, accuracy, and reliability of the Calibre nmPlatform. Tight collaboration with foundries, IC design houses, and industry standards organizations ensures Calibre tools continuously provide innovative functionality that meets or exceeds state-of-the-art requirements and delivers real competitive value.
Calibre is one of the most popular toolsthat is widely used by design organizations and foundries. Calibrehas different modules that perform a variety offunctions post-tapeout. Thechallenge ofthe post-tapeout workflow ismaintaining tight control for high waferyield that would lead to a reduction inthe time-to-mask and operation costs. Whilesome of the workloads from modules such asscatter barand bias in the pre-OPC stage arememory intensive, the workloads generated from PM, OPC,and MDP are latency intensive. They rely on the performance of the storage, network,and computeinfrastructure in ordertosupport and complement the speed and quality of Calibre.
Calibre is one of the most commonly usedtools in the silicon on chip (SoC) manufacturing process. This processhandles different parts of the workflow from Calma Graphic Data System (GDSII) to mask flow, providing high wafer yield and reducing the cost of operation. The input files provided from the chip design houses include physical details of SoCsin a GDSIIorOpen Artwork System Interchange Standard (OASIS)format. While Calibreas an application is getting more optimized to reduce the time to mask, the underlying storage infrastructure also plays a significant role on turnaround time (TAT).The infrastructureconsists of network file share storage, the network layer, and the compute farm. NetApp storage is primarily used to store the GDSII/OASIS files and the intellectual property filesin a shared file system accessed by Calibrefrom the compute farm nodes over Network File System(NFSv3).
Mentor Graphics Corporation, a Siemens business, is a world leader in electronic hardware and software design solutions, providing products, consulting services, and award-winning support for the world’s most successful electronic, semiconductor, and systems companies. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777.
Product: Mentor Graphics Calibre
Version: 2021.2_28.15 (aoj) *
Supported Architectures: x86_64
Website Home Page : http://www.mentor.com
Languages Supported: english
System Requirements: Linux *
Size: 5.8 Gb
Hardware
– Dual or Quad-Core CPU, clock speed of 2.0 GHz or better
– Graphics Processing Unit (GPU) OpenGL 2.0 capable, with at least 512 MB of VRAM
– System RAM: 8 GB
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