Mentor Graphics Calibre 2019.3 Linux

Mentor Graphics 很高兴地宣布 Calibre 2019.1 的可用性。Calibre 以我们强大的、经过生产验证的超扩展架构为基础，提供业内最广泛、最准确和性能最佳的 DFM 解决方案。

关于 Mentor Graphics Calibre。芯片设计生命周期从将逻辑设计概念化到在硅芯片上进行物理制造。除了一些大型半导体公司外，大多数设计芯片的半导体公司都没有自己的代工厂来实际制造芯片。无论哪种方式，设计文件都从设计团队/组织移交给代工厂，以在最终制造之前对真实硅晶片上的设计进行后端物理验证、压裂和掩蔽。所有设计组织在设计文件之前执行最终物理验证任务被送到铸造厂进行制造。这个过程称为流片。代工厂收到 GDSII/OASIS 文件后，文件将经过验证、规则检查、模式匹配 (PM)、光学邻近校正 (OPC) 和掩模数据准备 (MDP)。

Mentor Graphics Calibre 是设计组织和代工厂广泛使用的最受欢迎的工具之一。Calibre 具有不同的模块，可在流片后执行各种功能。流片后工作流程的挑战是严格控制高晶圆产量，这将导致掩模时间和运营成本的减少。虽然前 OPC 阶段中来自模块的一些工作负载（例如分散条和偏差）是内存密集型的，但从 PM、OPC 和 MDP 生成的工作负载是延迟密集型的。它们依靠存储、网络和计算基础设施的性能来支持和补充 Calibre 的速度和质量。

Mentor Graphics Calibre 是片上硅 (SoC) 制造过程中最常用的工具之一。该流程处理从 Calma 图形数据系统 (GDSII) 到掩模流程的不同部分工作流程，提供高晶圆产量并降低运营成本。芯片设计公司提供的输入文件包括采用 GDSII 或开放式艺术作品系统交换标准 (OASIS) 格式的 SoC 的物理细节。虽然 Calibreas 应用程序越来越优化以减少屏蔽时间，但底层存储基础架构在周转时间 (TAT) 方面也发挥着重要作用。基础架构由网络文件共享存储、网络层和计算群组成。

该视频介绍了 Calibre Automatic Waivers 按需培训课程、将涵盖的关键概念以及动手实验室环境中涵盖的详细信息。

Calibre Automatic Waivers 工具为设计 IP 的创建者提供了一种方法，能够将放弃的 DRC 和其他类型的验证结果传递给使用 IP 的最终设计者。本课程是从 IP 设计师创作的两个角度介绍的。

Mentor Graphics 隶属于西门子公司，是电子硬件和软件设计解决方案领域的全球领导者，为世界上最成功的电子、半导体和系统公司提供产品、咨询服务和屡获殊荣的支持。我们使公司能够更快、更具成本效益地开发更好的电子产品。我们的创新产品有助于克服复杂的设计挑战。Mentor 是全芯片仿真、功能验证、测试设计和物理验证方面的技术领导者，其 Veloce、Questa、Tessent 和 Calibre 平台。

Mentor Graphics is pleased to announce the availability of Calibre 2019.1. Building on our powerful, production-proven Hyperscaling architecture, Calibre delivers the broadest, most accurate, and best performing DFM solutions in the industry.

About Mentor Graphics Calibre. The chip design lifecyclegoesfrom conceptualizing a logical design to physically manufacturingit on a siliconchip. Most of the semiconductor companies thatdesign chips do not have their own foundries to actually manufacture the chips except for some large semiconductor companies. Eitherway,the design files are handed over from the design teams/organizations to the foundry to perform back-end physical verification, fracturing,and masking of thedesigns on real silicon wafers before theyend up in fabrication.Alldesign organizations perform final physical verificationtasks before the designfiles are sent to the foundries for manufacture. This process is called tapeout. Afterthe foundries receive the GDSII/OASIS files, the filesgo through verification, rule check, pattern matching(PM), optical proximity correction(OPC), and mask data preparation(MDP).Thenthey are finally manufactured in the fabrication units.

Mentor Graphics Calibre is one of the most popular toolsthat is widely used by design organizations and foundries. Calibrehas different modules that perform a variety offunctions post-tapeout. Thechallenge ofthe post-tapeout workflow ismaintaining tight control for high waferyield that would lead to a reduction inthe time-to-mask and operation costs. Whilesome of the workloads from modules such asscatter barand bias in the pre-OPC stage arememory intensive, the workloads generated from PM, OPC,and MDP are latency intensive. They rely on the performance of the storage, network,and computeinfrastructure in ordertosupport and complement the speed and quality of Calibre.

Mentor Graphics Calibre is one of the most commonly usedtools in the silicon on chip (SoC) manufacturing process. This processhandles different parts of the workflow from Calma Graphic Data System (GDSII) to mask flow, providing high wafer yield and reducing the cost of operation. The input files provided from the chip design houses include physical details of SoCsin a GDSIIorOpen Artwork System Interchange Standard (OASIS)format. While Calibreas an application is getting more optimized to reduce the time to mask, the underlying storage infrastructure also plays a significant role on turnaround time (TAT).The infrastructureconsists of network file share storage, the network layer, and the compute farm. NetApp storage is primarily used to store the GDSII/OASIS files and the intellectual property filesin a shared file system accessed by Calibrefrom the compute farm nodes over Network File System(NFSv3).

This video describes the Calibre Automatic Waivers on demand training class, the key concepts that will be covered, and detail covered in the hands-on lab environment.

The Calibre Automatic Waivers tool provides a way for creators of design IP to be able to pass along waived DRC and other types of verification results as waived to the end designers who use the IP. The course is presented from both the viewpoint of the IP designer creating.

Mentor Graphics, a Siemens Business, is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. We enable companies to develop better electronic products faster and more cost-effectively. Our innovative products help conquer complex design challenges. Mentor is technology leader in full chip emulation, Functional Verification, Design-for-Test and physical verification with its Veloce, Questa, Tessent and Calibre platforms.

Product: Mentor Graphics Calibre
Version: 2019.3_15.11 (aoi) *
Supported Architectures: x86_64
Website Home Page : http://www.mentor.com
Languages Supported: english
System Requirements: Linux *
Size: 4.3 Gb

Calibre supports x86_64 processors. There are two x86-64 processor products supplied by different vendors, AMD and Intel. The Calibre toolset is supported on computers based on either of these processors. As of the 2013.4 Calibre release, MGC_HOME is packaged as two trees, IXL and AOI. The different executables for the IXL and AOI trees are optimized for the different Linux distributions. For example, IXL supports RHEL 5 distributions; AOI supports RHEL 6 distributions. If you use both types of Linux distributions on your network, you should download and install both executables into the same target directory. Set the MGC_HOME variable to either the IXL or the AOI tree. When you invoke Calibre, it will auto-detect the operating system and execute from the correct MGC_HOME tree.
Hardware
– Dual or Quad-Core CPU, clock speed of 2.0 GHz or better
– Graphics Processing Unit (GPU) OpenGL 2.0 capable, with at least 512 MB of VRAM
– System RAM: 8 GB